熱門詞： 進(jìn)口電動(dòng)溫度調(diào)節(jié)閥結(jié)構(gòu)圖|進(jìn)口電動(dòng)溫度調(diào)節(jié)閥數(shù)據(jù)表進(jìn)口電動(dòng)高溫調(diào)節(jié)閥-德國進(jìn)口電動(dòng)高溫法蘭調(diào)節(jié)閥進(jìn)口電動(dòng)蒸汽調(diào)節(jié)閥-德國進(jìn)口電動(dòng)蒸汽調(diào)節(jié)閥
熱門詞： 進(jìn)口電動(dòng)溫度調(diào)節(jié)閥結(jié)構(gòu)圖|進(jìn)口電動(dòng)溫度調(diào)節(jié)閥數(shù)據(jù)表進(jìn)口電動(dòng)高溫調(diào)節(jié)閥-德國進(jìn)口電動(dòng)高溫法蘭調(diào)節(jié)閥進(jìn)口電動(dòng)蒸汽調(diào)節(jié)閥-德國進(jìn)口電動(dòng)蒸汽調(diào)節(jié)閥
美國Anric Anric
Founded in 2014 in Arlington, MA
Anric Technologies was founded by researchers from Harvard University to address the gap in the market for benchtop ALD tools designed and optimized for small samples and small budgets.
Several novel thin film processes have been developed including a recently patented hybrid ALD process for growing silica films. The AT-400 is a benchtop ALD tool specifically created to fill this gap. The tool design was inspired by observations made while working on a wide variety of deposition processes and device applications at Harvard.
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